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关键词:
Optical Lithography: Here Is Why
书目信息
ISBN:
0819475602(10位)
9780819475602(13位)
中图分类号:
O4 物理学
杜威分类号:
中文译名:
光学光刻
作者:
Burn J. Lin
编者:
语种:
eng
出版信息
出版社:
SPIE - The International Society for Optical Engineering
出版地:
出版年:
2009
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原版
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卷期:
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内容简介:
This book is aimed at new and experienced engineers, technology managers, and senior technicians who want to enrich their understanding of the image formation physics of a lithographic system. Readers will gain knowledge of the basic equations and constants that drive optical lithography, learn the basics of exposure systems and image formation, and come away with a full understanding of system components, processing, and optimization. Readers will also get a primer on the outlook of optical lithography and the many next-generation technologies that may greatly enhance semiconductor manufacturing in the near future. Topics covered in this title include: Exposure Systems; Image Formation; The Meter of Lithography; Components in Optical Lithography; Processing and Optimization; Immersion Lithography; and, Outlook for optical lithography. Burn Lin is editor-in-chief of the "Journal of Micro/Nanolithography", MEMS, and MOEMS, past chair of the "SPIE Advanced Lithography" symposium, author of two book chapters and over 75 articles, and holder of 37 U.S. patents. This book is aimed at new and experienced engineers, technology managers, and senior technicians who want to enrich their understanding of the image formation physics of a lithographic system. Readers will gain knowledge of the basic equations and constants that drive optical lithography, learn the basics of exposure systems and image formation, and come away with a full understanding of system components, processing, and optimization. Readers will also get a primer on the outlook of optical lithography and the many next-generation technologies that may greatly enhance semiconductor manufacturing in the near future Topics include: ? Exposure Systems ? Image Formation ? The Meter of Lithography ? Components in Optical Lithography ? Processing and Optimization ? Immersion Lithography ? Outlook for optical lithography Burn Lin is editor-in-chief of the Journal of Micro/Nanolithography, MEMS, and MOEMS ( JM3 ), past chair of the SPIE Advanced Lithography symposium, author of two book chapters and over 75 articles, and holder of 37 U.S. patents.
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页码:
300
装帧:
HB
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